Showerhead-assisted chemical vapor deposition of CsPbBr3 films for LED applications

Abstract CsPbBr 3 represents a highly attractive material for perovskite light-emitting diodes (PeLEDs) in the green spectral range. However, lack of deposition tools reproducible and scalable growth films is one major obstacles hindering PeLED commercialization. Here, we employ showerhead-assisted chemical vapor (CVD) method to produce uniform pinhole-free application. The precursors CsBr PbBr 2 are evaporated under low vacuum N carrier gas. By adjusting sublimation temperature, process conditions CsBr-rich, stoichiometric, -rich layer have been developed. A substrate temperature 160 °C enables direct these on polymeric hole transport (HTL), finally yielding PeLEDs with maximum luminance 125 cd/m . Although device efficiency still lags behind solution-processed counterparts, our approach presents first demonstration containing processed CVD reactor. Graphic abstract